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LSMO on STO substrate at 900 °C


RHEED intensity oscillation monitored on the specular spot during the growth of the LSMO on STO substrate at 900 °C. Inset a1 and a2: RHEED pattern obtained before and after deposition, respectively. (b) Resistivity/magnetization vs temperature curves for LSMO thin films of 5 nm thickness. STM topographic images (1x1 um2) with set point (sample bias 0.7 V, current 0.5 nA) taken at (c) 300 K and (d) 105 K.

Reprinted with permission from Abhimanyu Rana, Kashinath Bogle, Onkar Game, Shankar Patil, Nagarajan Valanoor, and Satishchandra Ogale, APPLIED PHYSICS LETTERS 96, 263108 2010. Copyright 2010, American Institute of Physics.

Microscope:
UHV3500 VT with Variable Magnetic Field


Controls:
RHK SPM 100

Contributors:
Abhimanyu Rana, Kashinath Bogle, Onkar Game, Shankar Patil, Nagarajan Valanoor, and Satishchandra Ogale - NCL, Pune and Univ. of New South Wales

Reference:
APPLIED PHYSICS LETTERS 96, 263108 (2010)

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